Forming method, production of metal nanostructures by crevice corrosion comprises the following steps: the choice of substrate material; on the surface of the substrate material evaporation a layer of metal film; surface rotating metal film coated with a layer of photoresist; select the mask, and the samples were exposed; will sample in developer in the developer, the photoresist pattern at the same time, the developer to soak, so as to form a gap between the edge of the metal film and photoresist structure; the photoresist patterned structure in high temperature baking oven; the sample into the liquid metal corrosion in corrosion, crevice corrosion cracks can be in photoresist and a metal film, when the metal inside and outside the crevice when the connection will take samples from the corrosive liquid and rinse with deionized water clean; wash away the photoresist structure samples, which are consistent with the gap edge in the metal on metal 20-80nm Nanostructure. The invention has the advantages of large area and arbitrary line graphics.
【技術實現步驟摘要】
【技術保護點】
１．利用縫隙腐蝕成形金屬納米結構的制作方法，其特征在于步驟如下：（１）根據需要選擇基片材料；（２）在基片材料表面蒸鍍一層金屬膜層；（３）在所述的金屬膜層表面旋涂一層光刻膠，形成樣片；（４）根據所需要的金屬納米線條分布情況選擇光刻掩模，并用紫外曝光機對光刻膠樣品進行曝光；（５）將曝光后的樣片放入顯影液內顯影，使光刻膠圖形化，同時在顯影液的浸泡下，使光刻膠結構邊緣與金屬膜之間形成縫隙；（６）將圖形化的光刻膠結構放入高溫烘箱進行烘焙，使所述的縫隙固定；（７）將上述樣片放入金屬腐蝕液里腐蝕，即可在光刻膠與金屬膜的縫隙處產生縫隙腐蝕，當縫隙內外金屬無連接時，將樣片從腐蝕液內取出并用去離子水沖洗干凈；（８）洗去樣片上的光刻膠結構，即在金屬上得到與縫隙邊緣一致的２０－８０ｎｍ的金屬納米結構。
【技術特征摘要】
【專利技術屬性】
技術研發人員：杜春雷，董小春，史立芳，鄧啟凌，
申請(專利權)人：中國科學院光電技術研究所，
類型：發明
國別省市：90
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